摘要 |
A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing. |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
RIEPEN, MICHEL;ROPS, CORNELIUS;VERDONCK, ADRIANUS MARINUS;EUMMELEN, ERIK;GRAAF, SANDRA;CORTIE, ROGIER HENDRIKUS MAGDALENA;KANEKO, TAKESHI;DZIOMKINA, NINA;BOKHOVEN, LAURENTIUS;EVANGELISTA, FABRIZIO;BESSEMS, DAVID |