| 摘要 |
<p>An object of the invention is to provide curable compositions for transfer materials suited for nanoimprinting processes, which compositions have high dry etching resistance against argon gas and high selectivity of dry etching rate between by argon gas and by oxygen gas, and can be fabricated into fine patterns used as resists or the like. A curable composition for transfer materials includes a (meth)acrylate compound having a triazine skeleton which is obtainable by reacting an aminotriazine compound, a compound having a hydroxyl group and a (meth) acryloyl group in the molecule, and an aldehyde.</p> |
