| 摘要 |
PURPOSE: A plasma reactor including a variable capacitively-coupled electrode is provided to efficiently control plasma by controlling the discharge area of a capacitively coupled electrode. CONSTITUTION: A plasma reaction space is formed in a reactor body(11). A substrate support(12) supports a processed substrate(13). A capacitively coupled electrode assembly includes a capacitively coupled electrode(31,33) in the reactor body to induce a plasma discharge. A power source(40) supplies a frequency power source to the capacitively coupled electrode assembly. A gas supply unit(20) supplies process gas to the reactor body. |
