DROPLET UNIT AND SUBSTRATE PROCESSING APPRATUS

摘要

PURPOSE: A discharging unit and a substrate processing apparatus is provided to prevent the generation of leakage by sealing an inlet and an outlet while a raw material is discharged and introduced. CONSTITUTION: A discharging unit includes a syringe(430), a cylinder rod(441), a first valve(460), and a second valve(470). The syringe includes an internal space, an inlet(431-1), and an outlet(431-2). The cylinder rod moves in the syringe. The first valve is in connection with the inlet of the syringe and controls the connection according to the movement of the cylinder rod. The second valve is in connection with the outlet of the syringe and controls the connection according to the movement of the cylinder.