发明名称 |
METHOD OF THREE DIMENSIONS IMPRINT LITHOGRAPHY |
摘要 |
<p>PURPOSE: A method of three-dimensional imprint lithography is provided to become compatible with existing equipments by using means for conventional imprint lithography including pressurization, heating or ultraviolet irradiation. CONSTITUTION: A stamp(10) includes a first stamp(11), a second stamp(12) ..., a N-1 stamp, and a N stamp to the top and the bottom direction, which at least more than one are overlapped on a substrate(30) each other. The N-1 stamp is composed of a material with greater hardness or intensity than the N stamp and is thicker than the N stamp and the cross section of a N-1 stamp pattern is bigger than that of the N stamp. A plurality of stamps is successively touched with the substrate at a constant time interval.</p> |
申请公布号 |
KR101055634(B1) |
申请公布日期 |
2011.08.10 |
申请号 |
KR20100054640 |
申请日期 |
2010.06.10 |
申请人 |
KOREA INSTITUTE OF MACHINERY & MATERIALS |
发明人 |
LIM, HYUNG JUN;LEE, JAE JONG;CHOI, KEE BONG;KIM, GEE HONG |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|