发明名称 METHOD OF THREE DIMENSIONS IMPRINT LITHOGRAPHY
摘要 <p>PURPOSE: A method of three-dimensional imprint lithography is provided to become compatible with existing equipments by using means for conventional imprint lithography including pressurization, heating or ultraviolet irradiation. CONSTITUTION: A stamp(10) includes a first stamp(11), a second stamp(12) ..., a N-1 stamp, and a N stamp to the top and the bottom direction, which at least more than one are overlapped on a substrate(30) each other. The N-1 stamp is composed of a material with greater hardness or intensity than the N stamp and is thicker than the N stamp and the cross section of a N-1 stamp pattern is bigger than that of the N stamp. A plurality of stamps is successively touched with the substrate at a constant time interval.</p>
申请公布号 KR101055634(B1) 申请公布日期 2011.08.10
申请号 KR20100054640 申请日期 2010.06.10
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 LIM, HYUNG JUN;LEE, JAE JONG;CHOI, KEE BONG;KIM, GEE HONG
分类号 H01L21/027 主分类号 H01L21/027
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