| 摘要 |
This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.
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