发明名称 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
摘要 In the present invention, two coil-shaped probes each detecting the intensity of a magnetic field in a direction around a center axis of a processing space are provided in a process vessel of a plasma processing apparatus. Each of the probes detects an induced electromotive force generated in the coil, and a computer calculates an amount of radio-frequency current from the induced electromotive force, based on a predetermined calculation principle. A difference between the amounts of the radio-frequency current detected by the probes is calculated, and a loss radio-frequency current amount passing out of a plasma area between upper and lower electrodes is calculated, whereby the flow of the radio-frequency current in the plasma is known.
申请公布号 US7993487(B2) 申请公布日期 2011.08.09
申请号 US20070692340 申请日期 2007.03.28
申请人 TOKYO ELECTRON LIMITED 发明人 YAMAZAWA YOHEI
分类号 H01L21/00;C23C14/00;C23C16/00 主分类号 H01L21/00
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