发明名称 Gas discharge laser chamber
摘要 One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
申请公布号 US7995637(B2) 申请公布日期 2011.08.09
申请号 US20090603486 申请日期 2009.10.21
申请人 CYMER, INC. 发明人 SANDSTROM RICHARD L.;PARTLO WILLIAM N.;BROWN DANIEL J. W.;MOOSMAN BRYAN G.;CHUNG TAE H.;DUFFEY THOMAS P.;FERRELL JAMES J.;HILSABECK TERANCE
分类号 H01S3/22 主分类号 H01S3/22
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