| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a sensor which can secure the strength of a thin film portion, in methods of manufacturing a sensor having the thin film portion. <P>SOLUTION: This method of manufacturing a sensor has: a metal film formation process in which a metal film 23 making up metal wiring 3 and 5 is formed on a first insulating film 22; a heat treatment process in which heat treatment for enlarging the particle size of the metal film 23 is performed; an etching process in which the metal wiring 3 and 5 is formed by etching the metal film 23 by ion milling; and a second insulating film formation process in which a second insulating film 25 is formed on the metal wiring. In the method, the etching process includes an unevenness reduction etching process in which unevenness formed on a surface of the first insulating film 22 by ion milling of the metal film 23 is reduced by etching, and the etching amount of the first insulating film 22 by the unevenness reduction etching process is set to at least 30% of the film thickness of the metal film 23. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
