发明名称 |
MAGNETORESISTIVE EFFECT ELEMENT, MAGNETIC MEMORY CELL USING SAME, AND RANDOM ACCESS MEMORY |
摘要 |
<p>Disclosed is a magnetoresistive effect element which uses a vertically magnetized material and has a high TMR ratio. Intermediate layers (31, 32) are inserted on the outer sides of a structure that consists of a CoFeB layer (41), an MgO barrier layer (10) and a CoFeB layer (42), said intermediate layers (31, 32) being composed of an elemental metal having a melting point of not less than 1600°C or an alloy containing the metal. By the insertion of the intermediate layers (31, 32), crystallization of the CoFeB layers proceeds from the MgO (001) crystal side during the annealing so that the CoFeB layers have a crystal orientation in the bcc(001) direction.</p> |
申请公布号 |
WO2011093252(A1) |
申请公布日期 |
2011.08.04 |
申请号 |
WO2011JP51264 |
申请日期 |
2011.01.25 |
申请人 |
HITACHI, LTD.;TOHOKU UNIVERSITY;IKEDA SHOJI;OHNO HIDEO;YAMAMOTO HIROYUKI;ITO KENCHI;TAKAHASHI HIROMASA |
发明人 |
IKEDA SHOJI;OHNO HIDEO;YAMAMOTO HIROYUKI;ITO KENCHI;TAKAHASHI HIROMASA |
分类号 |
H01L21/8246;H01F10/16;H01F10/30;H01L27/105;H01L29/82;H01L43/08;H01L43/10 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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