发明名称 SUBSTRATE FOR LIQUID DISCHARGE HEAD AND METHOD FOR MANUFACTURING THE LIQUID DISCHARGE HEAD
摘要 PROBLEM TO BE SOLVED: To solve the problem that a projecting part breaks and occludes in a discharge port or others and the reliability of the liquid discharge head is deteriorated, when mounting or assembling the liquid discharge head, in the case of presence of the projecting part, because a layer of silicon oxide projects and remains at the end part of a supplying port, when using the layer of the silicon oxide as an etching mask for making the supplying port, when manufacturing a liquid discharge head. SOLUTION: A concave part 10a is formed by using etching liquid which has a large etching selectivity ratio of the silicon oxide layer and silicon and hardly etches the silicon oxide layer on a silicon substrate 1 having a mask 13 of the silicon oxide layer. Then, the silicon oxide layer 13 is eliminated by using etching liquid having smaller etching selectivity ratio of the silicon oxide and the silicon and the supplying port 10 is formed by piercing the concave part 10a. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011148296(A) 申请公布日期 2011.08.04
申请号 JP20100264124 申请日期 2010.11.26
申请人 CANON INC 发明人 ABO HIROYUKI;WATANABE KEIJI;MATSUMOTO KEIJI
分类号 B41J2/16;B41J2/05 主分类号 B41J2/16
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