| 摘要 |
According to one embodiment, a semiconductor device includes a first circuit unit having first and second interconnects, a second circuit unit having third and fourth interconnects, and an intermediate unit provided therebetween and having first and second transistors juxtaposed to each other along a direction perpendicular to a direction from the first circuit unit toward the second circuit unit. A high impurity concentration region in a first connection region of one diffusion layer of the first transistor is connected to the first interconnect, and other diffusion layer is connected to the third interconnect. A distance from the first connection region to a gate is longer than a distance from the second connection region to a gate. An midpoint region with a narrower width than the first connection region is provided between the gate and the first connection region of the one diffusion layer of the first transistor.
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