| 摘要 |
The invention relates to a mold for nanoprinting lithography as well as the methods for producing same. Said mold comprises a surface which includes n structured area(s) with micrometric or nanoscale patterns, n being an integer greater than or equal to 1. Said structured surface belongs to a first layer which is supported by a second layer, the first layer being made of a rigid material and the second layer being made of a flexible material. Said mold can further include n intermediate layers arranged between the first layer and the second layer, n being an integer greater than or equal to 1, and wherein modulus of elasticity of the second layer is less than the modulus of elasticity of the nth intermediate layer adjacent to the second layer, and if n is greater than 1, the modulus of elasticity of the (i)th intermediate layer is greater than the modulus of elasticity of the (i + 1)th intermediate layer, with i = 1 to (n-1). |
