METHOD FOR PRODUCING A PHOTOVOLTAIC CELL INCLUDING THE PREPARATION OF THE SURFACE OF A CRYSTALLINE SILICON SUBSTRATE

摘要

The invention relates to a method for creating at least one photovoltaic cell that consecutively includes anisotropically etching a surface (1a) of a crystalline silicon substrate (1) and treating said surface (1a) by means of isotropic etching. Treatment by means of isotropic etching includes at least two consecutive operations that respectively involve forming a silicon oxide thin film (11), having a regulated mean thickness between 10 nm and 500 nm, and removing said thus-formed thin film. The operation that involves forming a silicon oxide thin film (11) on the surface (1a) of the substrate (1) is carried out by means of thermally activated dry oxidation. Such a method makes it possible to improve the surface condition of the surface (1a) of the substrate (1) once the latter is anisotropically etched.