| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a display device, for forming a conductive film on a glass substrate without using a sputtering process. <P>SOLUTION: The method includes a chemical polishing step of bringing an etching liquid into contact with the surface of a glass substrate for a display device, to control the arithmetic average roughness Ra of the glass surface to 0.7 nm to 70 nm; and a film-forming step of applying a conductive polymer on the glass surface, after the chemical polishing step, to form a conductive film having a resistivity of 400 to 1,200Ω/sq. The total ray transmittance of the glass substrate after the film forming step is controlled set at 87% or more in the glass substrate having 0.5 mm thickness. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
