发明名称 |
MICRO-CONFORMAL TEMPLATES FOR NANOIMPRINT LITHOGRAPHY |
摘要 |
A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity. |
申请公布号 |
WO2011094317(A2) |
申请公布日期 |
2011.08.04 |
申请号 |
WO2011US22583 |
申请日期 |
2011.01.26 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
MILLER, MICHAEL N.;XU, FRANK Y.;STACEY, NICHOLAS A. |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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地址 |
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