| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multi-tone exposure mask, which is high in production yield or quality and easy to manufacture without needing an expensive device. <P>SOLUTION: The multi-tone exposure mask 1 has, on a transparent substrate 10, a mask pattern composed of a light-shielding portion 40 and a semi-translucent portion 30 which reduces the exposure light transmittance by a predetermined quantity. The semi-translucent portion 30 is composed of an inorganic multilayer film 31 obtained by alternately laminating a high-refractive index layer and a low-refractive index layer. In the multi-tone exposure mask 1, the outermost surface layer of the inorganic multilayer film 31 is preferably composed of the high-refractive index layer. <P>COPYRIGHT: (C)2011,JPO&INPIT |
