REPLACEMENT GATE APPROACH BASED ON A REVERSE OFFSET SPACER APPLIED PRIOR TO WORK FUNCTION METAL DEPOSITION

摘要

In a replacement gate approach, a spacer may be formed in the gate opening after the removal of the placeholder material, thereby providing a superior cross-sectional shape upon forming any electrode metals in the gate opening. Moreover, the spacer may be used for reducing the gate length, while not requiring more complex gate patterning strategies.