发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition which becomes a cured product excellent in heat resistance, mechanical properties, chemical resistance and adhesion to a substrate, can be cured in a low-temperature process, and exhibits excellent sensitivity and resolution. <P>SOLUTION: The positive photosensitive resin composition comprises (a) a polyimide, a polybenzoxazole or one of their precursors, each of which is soluble in an aqueous alkali solution, (b) a compound which generates an acid upon irradiation with light, (c) a compound having only one epoxy group within the molecule, and (d) a crosslinking agent having no epoxy group within the molecule. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011150165(A) 申请公布日期 2011.08.04
申请号 JP20100011828 申请日期 2010.01.22
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 MINEGISHI TOMONORI;ONO TAKASHI;KOTANI SHINJI;KONNO TAKU;OE TADAYUKI
分类号 G03F7/023;C08G73/22;G03F7/004;G03F7/40;H01L21/027 主分类号 G03F7/023
代理机构 代理人
主权项
地址