发明名称 |
FIELD EFFECT TRANSISTOR, ELECTRONIC DEVICE, AND FIELD EFFECT TRANSISTOR MANUFACTURING METHOD AND USING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a field effect transistor not broken regardless of application of overvoltage and overcurrent without over-increasing the chip area. SOLUTION: In the field effect transistor, a gate electrode 110, a drain electrode 109, a source electrode 108, and a protection diode (a protection diode electrode) 111 are disposed on a semiconductor layer. The drain electrode 109 is formed to surround a part or the entire of the surrounding of the protection diode 111, or a plurality of drain electrodes 109 are provided and formed such that the protection diode 111 is disposed between at least a pair of drain electrodes of the plurality of drain electrodes 109. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011151155(A) |
申请公布日期 |
2011.08.04 |
申请号 |
JP20100010539 |
申请日期 |
2010.01.20 |
申请人 |
NEC CORP |
发明人 |
NAKAYAMA TATSUO;ANDO YUJI;OKAMOTO YASUHIRO;INOUE TAKASHI;OTA KAZUKI;ENDO KAZUTOMI |
分类号 |
H01L21/338;H01L21/28;H01L21/822;H01L21/8232;H01L21/8234;H01L27/04;H01L27/06;H01L27/088;H01L27/095;H01L29/41;H01L29/778;H01L29/78;H01L29/786;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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