| 摘要 |
PROBLEM TO BE SOLVED: To provide an Ni-alloy sputtering target which can be used for a long term, and a method for manufacturing the same. SOLUTION: In the Ni-alloy sputtering target consisting of an Ni-alloy having the average crystal grain size of≤1,000μm, the crystal orientation of the sputtering surface is random orientation, which is the crystal orientation in the center plane in the thickness direction of the target. The peak order is preferably unchanged even when the X-ray diffraction is performed for the powder thereof. Further, the thickness is preferably≥3 mm. COPYRIGHT: (C)2011,JPO&INPIT
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