| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and apparatus for imprint lithography, which can dissipate electrons in a template using a non-conductive substrate during e-beam lithography. <P>SOLUTION: The method for imprint lithography includes steps of: depositing a material on a patterned surface of a conductive substrate; and pressing a transparent substrate and the conductive substrate to each other, and the pressing causes the material to conform to the patterned surface. Energy is applied to the material to form a patterned material from the material. The transparent substrate and the conductive substrate are separated, the patterned material adheres to the transparent substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
