| 摘要 |
A substrate carrying device decides whether or not a substrate received from a substrate supporting device is supported therein in a correct position. A support arm provided with support lugs and strain gages attached to the support lugs, respectively, is advanced to a forward position, and then the support arm is raised relative to lifting pins supporting a wafer to receive the wafer from the lifting pins. The strain gages measure strains produced in the support lugs, respectively, when load is placed on the support lugs. Decision about whether or not the wafer is supported in a correct position on the support lugs is made on the basis of strains measured by the strain gages. When it is decided that the wafer is supported in an incorrect position on the support lugs, the retraction of the support arm is inhibited.
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