| 摘要 |
The invention relates to an apparatus for determining and/or monitoring at least one process variable. The apparatus includes: At least one substrate (1), which is composed of a substrate material; at least one sensitive layer (2), which is applied on the substrate (1) and which produces at least one measured variable dependent on the process variable and/or on a change of the process variable; and at least one passivating layer (3), which is applied on the sensitive layer. The invention provides that the passivating layer (3) consists at least partially of the substrate material.
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