发明名称 CHUCKING METHOD, CHUCKING DEVICE, SUBSTRATE LAMINATING DEVICE, AND MULTILAYER SEMICONDUCTOR MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method of electrostatically chucking a substrate on a substrate holder reliably. SOLUTION: The chucking method of electrostatically chucking the substrate on the substrate holder includes an initial voltage step of applying an initial voltage to the substrate holder when mounting the substrate on the substrate holder, an chucking detection step of detecting whether the substrate is chucked to the substrate holder by measuring a leakage current while applying the initial voltage, and an chucking voltage step of applying an chucking voltage lower than the initial voltage to the substrate holder when it is detected that the substrate is chucked to the substrate holder in the chucking detection step. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011151079(A) 申请公布日期 2011.08.04
申请号 JP20100009337 申请日期 2010.01.19
申请人 NIKON CORP 发明人 USHIJIMA MIKIO
分类号 H01L21/683;H01L21/02 主分类号 H01L21/683
代理机构 代理人
主权项
地址