METHOD FOR MANUFACTURING MICROMACHINED DEVICE, AND MICROMACHINED DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a micromachined device at low process temperature without depending on a process for manufacturing a driving electronics or on a substrate mold utilized. SOLUTION: There is provided a method for manufacturing a micromachined device. The method includes: a step of providing a structural layer (101) of amorphous semiconductor material; a step of defining a first region (111) and a second region (112) in the structural layer (101); a step of providing a shielding layer above the first region (111), thereby leaving the second region (112) unshielded; a step of annealing the second region (112) of the structural layer (101) with a first fluence; a step of removing the shielding layer thereafter; and a step of annealing the first region (111) and the second region (112) of the structural layer (101) with a second fluence being substantially smaller than the first fluence. COPYRIGHT: (C)2011,JPO&INPIT