| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern having excellent resolution and excellent line edge roughness by using a salt for a resist composition. <P>SOLUTION: The salt is represented by formula (I) (wherein, Q<SP>1</SP>and Q<SP>2</SP>each independently represents fluorine atom or 1-6C perfluoroalkyl; L represents bivalent 1-17C saturated hydrocarbon, in which -CH<SB>2</SB>- contained in the bivalent saturated hydrocarbon may be replaced with -O- or -CO-; W<SP>1</SP>represents 2-36C heterocycle, in which the hydrogen atom contained in the heterocycle may be replaced with halogen atom, hydroxy, 1-24C hydrocarbon; 1-12C alkoxy, 2-4C acyl or 2-4C acyloxy; -CH<SB>2</SB>- contained in the heterocycle may be replaced with -O-: and Z<SP>+</SP>represents an organic counter ion). <P>COPYRIGHT: (C)2011,JPO&INPIT |
