发明名称 METHOD FOR FORMING PATTERNED CONDUCTIVE FILM
摘要 Disclosed is a method for forming a patterned conductive film, which is characterized by comprising a step wherein a substrate that is provided with a patterned layer composed of platinum microcrystal particles is brought into contact with a complex of an amine compound and aluminum hydride at a temperature of 50-120°C. By this method, a patterned conductive film which can secure an electrical connection with a substrate and is suitable for use in various electronic devices can be formed by a simple procedure without requiring large and heavy equipment.
申请公布号 WO2011093515(A1) 申请公布日期 2011.08.04
申请号 WO2011JP52185 申请日期 2011.01.26
申请人 JAPAN SCIENCE AND TECHNOLOGY AGENCY;JSR CORPORATION;SHIMODA TATSUYA;MATSUKI YASUO;SHEN ZHONGRONG 发明人 SHIMODA TATSUYA;MATSUKI YASUO;SHEN ZHONGRONG
分类号 C23C18/10;H05K3/00 主分类号 C23C18/10
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