发明名称 |
METHOD FOR FORMING PATTERNED CONDUCTIVE FILM |
摘要 |
Disclosed is a method for forming a patterned conductive film, which is characterized by comprising a step wherein a substrate that is provided with a patterned layer composed of platinum microcrystal particles is brought into contact with a complex of an amine compound and aluminum hydride at a temperature of 50-120°C. By this method, a patterned conductive film which can secure an electrical connection with a substrate and is suitable for use in various electronic devices can be formed by a simple procedure without requiring large and heavy equipment. |
申请公布号 |
WO2011093515(A1) |
申请公布日期 |
2011.08.04 |
申请号 |
WO2011JP52185 |
申请日期 |
2011.01.26 |
申请人 |
JAPAN SCIENCE AND TECHNOLOGY AGENCY;JSR CORPORATION;SHIMODA TATSUYA;MATSUKI YASUO;SHEN ZHONGRONG |
发明人 |
SHIMODA TATSUYA;MATSUKI YASUO;SHEN ZHONGRONG |
分类号 |
C23C18/10;H05K3/00 |
主分类号 |
C23C18/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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