发明名称 METHOD OF MANUFACTURING SINGLE-CRYSTAL GAN SUBSTRATE, AND SINGLE-CRYSTAL GAN SUBSTRATE
摘要 PURPOSE: A gallium nitride mono crystal substrate and a manufacturing method thereof are provided to designate an off angle and a direction of the off angle of a gallium nitride crystal by an off angle and a direction of the off angle of a ground substructure. CONSTITUTION: A GaN(Gallium Nitride) self-supporting substrate having off-angle is used as a ground substrate. A GaN mono crystal layer which has enough thickness is arranged on the GaN self-supporting substrate. The GaN mono crystal layer is sliced to the thickness direction and manufactured. GaN self-supporting substrates having a plurality of off angles are manufactured.
申请公布号 KR20110088483(A) 申请公布日期 2011.08.03
申请号 KR20110069032 申请日期 2011.07.12
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 KASAI HITOSHI;MOTOKI KENSAKU
分类号 C30B29/38;H01L21/20;C30B25/02;C30B25/18;C30B29/40;H01L21/205;H01L33/16;H01L33/32 主分类号 C30B29/38
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