发明名称 |
METHOD OF MANUFACTURING SINGLE-CRYSTAL GAN SUBSTRATE, AND SINGLE-CRYSTAL GAN SUBSTRATE |
摘要 |
PURPOSE: A gallium nitride mono crystal substrate and a manufacturing method thereof are provided to designate an off angle and a direction of the off angle of a gallium nitride crystal by an off angle and a direction of the off angle of a ground substructure. CONSTITUTION: A GaN(Gallium Nitride) self-supporting substrate having off-angle is used as a ground substrate. A GaN mono crystal layer which has enough thickness is arranged on the GaN self-supporting substrate. The GaN mono crystal layer is sliced to the thickness direction and manufactured. GaN self-supporting substrates having a plurality of off angles are manufactured.
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申请公布号 |
KR20110088483(A) |
申请公布日期 |
2011.08.03 |
申请号 |
KR20110069032 |
申请日期 |
2011.07.12 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
KASAI HITOSHI;MOTOKI KENSAKU |
分类号 |
C30B29/38;H01L21/20;C30B25/02;C30B25/18;C30B29/40;H01L21/205;H01L33/16;H01L33/32 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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