| 摘要 |
PURPOSE: A cleaner composition for removing metal oxides is provided to remove inorganic residues after the etching and the removal of resist without the use of fluorine-based compounds. CONSTITUTION: A cleaner composition for removing metal oxides comprises: 0.1-10 weight% of a first chelating agent including a pentanedione compound; 1-20 weight% of a second chelating agent including organic acids or amine groups; 0.1-10 weight% of anticorrosive agents; 10-80 weight% of aqueous organic solvents; 0.01-0.2 weight% of surfactants; and the remaining amount of water. The first chelating agent is selected from 2,3-pentanedione, 2,4-pentanedione-2,3,4-trioxime, and 3,3-dimethyl-2,4-pentanedione. |
