| 发明名称 |
PARTICLE MITIGATION FOR IMPRINT LITHOGRAPHY |
| 摘要 |
Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described. |
| 申请公布号 |
KR20110088499(A) |
申请公布日期 |
2011.08.03 |
| 申请号 |
KR20117007378 |
申请日期 |
2009.09.30 |
| 申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
RESNICK DOUGLAS J.;MCMACKIN IAN M.;SCHMID GERARD;KHUSNATDINOV NIYAZ;THOMPSON ECRON;SREENIVASAN SIDLGATA V. |
| 分类号 |
B29C33/38;B29C59/02 |
主分类号 |
B29C33/38 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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