POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

摘要

PURPOSE: A positive type resist material and a pattern forming method are provided to implement a fine processing process by increasing the resolution and the mask fidelity of a resist pattern. CONSTITUTION: A positive type resist material includes a compound generating acid by responding to active ray or radiation ray and a resin component which is soluble in an alkaline developing solution based on the action of acid. In the resin component, at least part of a resin soluble group is carboxylic group. The positive type resin material includes a compound activating or condensing the carboxylic group, which is carbodimide or a triazine-based condensing agent. A nitrogen-containing compound, a quencher, and a surfactant are further contained in the positive resist material.