| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the same are provided to improve line edge roughness and pattern shapes using electronic beam, X-ray, or extreme ultraviolet ray as exposing light source. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a repeating unit and a resin. The repeating unit generates acid by being decomposed by active ray or radiation ray. The resin includes two or more repeating units generating different alkaline soluble groups based on the action of acid. One repeating unit of the resin is represented by chemical formula V, and another repeating unit of the resin is represented by chemical formula VI. In the chemical formula V, the R51, the R52, and the R53 are respectively hydrogen atom, an alkyl group, a monovalent aliphatic hydrocarbon group, halogen atom, a cyano group, or an alkoxy carbonyl group. The R54 represents an alkyl group. The R55 and the R56 are respectively hydrogen atom, an alkyl group, a monovalent aliphatic hydrocarbon ring, or a monovalent aromatic ring.</p> |
