发明名称 |
MAGNETIC PATTERNING METHOD AND SYSTEM |
摘要 |
<p>The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.</p> |
申请公布号 |
EP2349917(A2) |
申请公布日期 |
2011.08.03 |
申请号 |
EP20090799426 |
申请日期 |
2009.11.03 |
申请人 |
YEDA RESEARCH AND DEVELOPMENT COMPANY LTD. |
发明人 |
NAAMAN, RON;BARDEA, AMOS;YOFFE, ALEXANDER |
分类号 |
B81C1/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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