| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a multilayer halftone type phase shift mask in which a transmittance suppressing effect produced when using the halftone type phase shift mask consisting of a conventional bilayer or multilayer film in the wavelength range of 140 to 200 nm including the wavelength of 157 nm of an F2 excimer laser, and produced accompanying a high transmittance layer does not matter, and to provide its mask blank. SOLUTION: A phase shifter film is composed of two layers of a low transmittance layer with a function to mainly adjust transmittance, and a high transmittance layer with a function to mainly adjust a phase shift amount. When the extinction coefficient of the low transmittance layer is defined as K1 and the extinction coefficient of the high transmittance layer is defined as K2 , the range of K2 <K1 <=3.0 is satisfied in an exposure wavelength &lambda selected from the range of 140 to 200 nm wavelength. When the film thickness of the low transmittance layer is defined as d1 , 0.001<=K1 d1 /&lambda <=0.500 is satisfied in the exposure wavelength &lambda .</p> |
