发明名称 SELECT DEVICES INCLUDING AN OPEN VOLUME, MEMORY DEVICES AND SYSTEMS INCLUDING SAME, AND METHODS FOR FORMING SAME
摘要 <p>Select devices including an open volume that functions as a high bandgap material having a low dielectric constant are disclosed. The open volume may provide a more nonlinear, asymmetric I-V curve and enhanced rectifying behavior in the select devices. The select devices may comprise, for example, a metal-insulator-insulator-metal (MIIM) diode. Various methods may be used to form select devices and memory systems including such select devices. Memory devices and electronic systems include such select devices.</p>
申请公布号 KR20110088540(A) 申请公布日期 2011.08.03
申请号 KR20117012413 申请日期 2009.11.09
申请人 MICRON TECHNOLOGY, INC. 发明人 SRINIVASAN BHASKAR;SANDHU GURTEJ S.
分类号 H01L21/8247;H01L21/328;H01L29/792;H01L29/861 主分类号 H01L21/8247
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