发明名称 Polishing method and polishing apparatus
摘要 A polishing method that carries out a multi-step polishing process with improved polishing conditions (polishing recipe) while omitting measurement of the surface conditions of a substrate, as carried out between polishing steps thereby increasing the throughput. The polishing method for polishing workpieces by repeating the sequential operations of taking a workpiece out of a cassette in which a plurality of workpieces are stored, carrying out multi-step polishing of a surface of the workpiece and returning the workpiece to the cassette, includes carrying out one of the following two polishing processes for the workpiece taken out of the cassette: a first polishing process comprising carrying out the multi-step polishing under preset conditions and measurement of the surface of the workpiece before and after each polishing step; and a second polishing process comprising carrying out a predetermined step of the multi-step polishing under polishing conditions which have been modified based on the results of the measurement.
申请公布号 US7989348(B2) 申请公布日期 2011.08.02
申请号 US20060508140 申请日期 2006.08.23
申请人 EBARA CORPORATION 发明人 YAMAGUCHI KUNIAKI;TORIKOSHI TSUNEO
分类号 H01L21/302;B24B37/04;B24B49/03;B24B51/00;H01L21/304 主分类号 H01L21/302
代理机构 代理人
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