发明名称 |
METHOD FOR MANUFACTURING SINGLE CRYSTAL |
摘要 |
PURPOSE: A monocrystal growing method is provided to control a crystallizing interface according to a high volatility low melting temperature dopant injection, thereby enabling control in a temperature side or monocrystal growing speed side during each monocrystal growing process. CONSTITUTION: A monocrystal growing method includes the following procedures. A silicon melt is formed. A dopant with a lower melting point than silicon is injected into the silicon melt. The temperature of each monocrystal growing step without a dopant injection is higher than the temperature of each monocrystal growing step with the dopant injection. The temperature decreasing width of each monocrystal growing step in a case of a first dopant density is smaller than the temperature decreasing width of each monocrystal growing step with a second dopant density which is higher than the first dopant density.
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申请公布号 |
KR20110086979(A) |
申请公布日期 |
2011.08.02 |
申请号 |
KR20100006400 |
申请日期 |
2010.01.25 |
申请人 |
LG SILTRON INCORPORATED |
发明人 |
HWANG, JUNG HA;LEE, HONG WOO;KIM, SANG HEE |
分类号 |
C30B15/04;C30B15/20;C30B29/06 |
主分类号 |
C30B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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