发明名称 METHOD FOR MANUFACTURING SINGLE CRYSTAL
摘要 PURPOSE: A monocrystal growing method is provided to control a crystallizing interface according to a high volatility low melting temperature dopant injection, thereby enabling control in a temperature side or monocrystal growing speed side during each monocrystal growing process. CONSTITUTION: A monocrystal growing method includes the following procedures. A silicon melt is formed. A dopant with a lower melting point than silicon is injected into the silicon melt. The temperature of each monocrystal growing step without a dopant injection is higher than the temperature of each monocrystal growing step with the dopant injection. The temperature decreasing width of each monocrystal growing step in a case of a first dopant density is smaller than the temperature decreasing width of each monocrystal growing step with a second dopant density which is higher than the first dopant density.
申请公布号 KR20110086979(A) 申请公布日期 2011.08.02
申请号 KR20100006400 申请日期 2010.01.25
申请人 LG SILTRON INCORPORATED 发明人 HWANG, JUNG HA;LEE, HONG WOO;KIM, SANG HEE
分类号 C30B15/04;C30B15/20;C30B29/06 主分类号 C30B15/04
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