发明名称 Apparatus and method for specimen fabrication
摘要 A specimen fabricating apparatus comprises: a specimen stage, on which a specimen is placed; a charged particle beam optical system to irradiate a charged particle beam on the specimen; an etchant material supplying source to supply an etchant material, which contains fluorine and carbon in molecules thereof, does not contain oxygen in molecules thereof, and is solid or liquid in a standard state; and a vacuum chamber to house therein the specimen stage. A specimen fabricating method comprises the steps of: processing a hole in the vicinity of a requested region of a specimen by means of irradiation of a charged particle beam; exposing the requested region by means of irradiation of the charged particle beam; supplying an etchant material, which contains fluorine and carbon in molecules thereof, does not contain oxygen in molecules thereof, and is solid or liquid in a standard state, to the requested region as exposed; and irradiating the charged particle beam on the requested region as exposed.
申请公布号 US7989782(B2) 申请公布日期 2011.08.02
申请号 US20090354153 申请日期 2009.01.15
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TOMIMATSU SATOSHI;TAKAHASHI MIYUKI;SHICHI HIROYASU;FUKUDA MUNEYUKI
分类号 G21G5/00 主分类号 G21G5/00
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