发明名称 Plasma reactor with reduced electrical skew using electrical bypass elements
摘要 RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.
申请公布号 US7988815(B2) 申请公布日期 2011.08.02
申请号 US20070828568 申请日期 2007.07.26
申请人 APPLIED MATERIALS, INC. 发明人 RAUF SHAHID;COLLINS KENNETH S.;BERA KALLOL;RAMASWAMY KARTIK;HANAWA HIROJI;NGUYEN ANDREW;SHANNON STEVEN C.;WONG LAWRENCE;KOBAYASHI SATORU;DETRICK TROY S.;CRUSE JAMES P.
分类号 C23C16/00;H01L21/306 主分类号 C23C16/00
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