| 发明名称 |
METHOD AND APPARATUS FOR OPTICAL INSPECTION, DETECTION AND ANALYSIS OF DOUBLE SIDED AND WAFER EDGE MACRO DEFECTS |
| 摘要 |
<p>Method and apparatus for detection and characterization of defects, and working order assessment of fab processing operation.</p> |
| 申请公布号 |
IL213025(D0) |
申请公布日期 |
2011.07.31 |
| 申请号 |
IL20110213025 |
申请日期 |
2011.05.19 |
| 申请人 |
MAY HIGH-TECH SOLUTION LTD. |
发明人 |
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| 分类号 |
G01N |
主分类号 |
G01N |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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