发明名称 |
PHOTORESIST COMPOSITIONS AND EMTHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS |
摘要 |
Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. |
申请公布号 |
IL213195(D0) |
申请公布日期 |
2011.07.31 |
申请号 |
IL20110213195 |
申请日期 |
2011.05.29 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, LLC |
发明人 |
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分类号 |
G03C |
主分类号 |
G03C |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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