Photovoltaic cell realizing method, involves anisotropic engraving substrate surface, and isotropic chemical engraving surface by silicon oxide formation by oxidation agent and elimination of oxide by engraving agent

摘要

The method involves anisotropic engraving a surface (1a) of a crystalline silicon substrate (1). The surface is isotropic chemical engraved by silicon oxide formation by an oxidation agent i.e. ozone, and elimination of the silicon oxide by an engraving agent i.e. hydrofluoric acid, simultaneously. The elimination of the oxide is carried out by contacting the surface with the hydrofluoric acid solution and setting the surface to contact hydrofluoric acid vapor.