| 摘要 |
A process for producing a substrate having a patterned conductive polymer film is provided in which stripping properties are excellent, and discoloration of an end part of the conductive polymer film when a resist film is stripped from the conductive polymer film is suppressed. The process for producing a substrate having a patterned conductive polymer film includes in sequence a step of forming a substrate having in order above the substrate a conductive polymer film and a patterned resist film, a step of etching the conductive polymer film in accordance with the resist film pattern, and a step of stripping the resist film above the conductive polymer film by means of a stripping liquid, the stripping liquid containing an organic solvent (A) at 5 to 40 wt % selected from the group consisting of an N -alkylpyrrolidone, a carboxylic acid amide compound, a dialkyl sulfoxide, and an ether compound and an organic solvent (B) at 60 to 95 wt % selected from the group consisting of an alkyrolactone, an alkylene carbonate, and a polyhydric alcohol. |
