WORKPIECE HANDLING SYSTEM

摘要

A workpiece handling system (100) includes a process chamber (114) configured to support a workpiece for ion implantation, a first mask (172, 174, 176) stored outside the process chamber (114) in a mask station (170), and a robot system (106) configured to retrieve the first mask (172, 174, 176) from the mask station (170), and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask (172, 174, 176) outside a process chamber (114) in a mask station (170), retrieving the first mask from the mask station (170), position ing the first mask upstream of a workpiece positioned in the process chamber (114) for ion implantation, and performing a first selective implant through the first mask.