发明名称 METHOD FOR CHEMICALLY TREATING A SUBSTRATE
摘要 A method for chemically treating a disc-shaped substrate having a bottom surface, a top surface and side surfaces by contacting a process medium that is fluid-chemically active with at least the bottom surface of the substrate. The substrate is moved relative to the process medium while forming a triple line between the substrate, the substrate medium and the atmosphere surrounding the substrate and medium. In order to chemically remove errors, particularly in the side surfaces, relative motion should be carried out while avoiding a contacting of the process medium with the top surface of the substrate, where the triple line is formed at a desired height of the side surface facing away from the process medium flow side in relation to the relative motion between the substrate and the process medium. In this way, the atmosphere can be adjusted in relation to the partial pressures of the components in the process medium such that the top surface preserves hydrophobic characteristics.
申请公布号 US2011183524(A1) 申请公布日期 2011.07.28
申请号 US200913059560 申请日期 2009.09.29
申请人 SCHOTT SOLAR AG 发明人 TEPPE ANDREAS;SCHUM BERTHOLD;FRANKE DIETER;SCHWIRTLICH INGO;VAAS KNUT;SCHMIDT WILFRIED
分类号 H01L21/306 主分类号 H01L21/306
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