| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposing method by which a dummy PS can be formed in a nondisplay area located at the outside of four sides of a display area on a color filter substrate by using a small mask continuous exposure system. <P>SOLUTION: As shown in (a), a layer 91 is exposed in the display area while conveying a substrate 20 to which a photoresist is applied in a Y direction and exposing a first layer 81 in a first nondisplay area 51 (an area shown by hatchings diagonally rising to the right) on the substrate 20. Then as shown in (b), a second layer 82 is exposed in a second nondisplay area 52 (an area shown by hatchings diagonally rising to the right) while conveying the substrate 20 in a X direction after rotating the substrate 20 by 90°. Thereby a dummy PS 71 can be formed in the first nondisplay area 51 and a dummy PS 72 can be formed in the second nondisplay area 52 with a desired arrangement pitch and a desired shape. <P>COPYRIGHT: (C)2011,JPO&INPIT |
