发明名称 BUFFER LAYER FOR PHOTOELECTRIC ELEMENT, METHOD OF MANUFACTURING THE SAME, AND PHOTOELECTRIC ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a buffer layer for a photoelectric element such that a CdS buffer layer having excellent characteristics can be formed on a light absorption layer of a CZTS-based semiconductor, a CIGS-based semiconductor, etc., a method of manufacturing the same, and the photoelectric element having the buffer layer obtained by such a method. <P>SOLUTION: The present invention relates to the method of manufacturing the buffer layer for the photoelectric element including a CBD process of forming a CdS film on the surface of the light absorption layer by dipping a substrate having the light absorption layer formed in a CBD solution containing cadmium salt, a sulfur source, and a sulfide synthesizing auxiliary agent, and a heat treatment process of subjecting the CdS film to a heat treatment in an oxidizing atmosphere at a temperature higher than 200°C and equal to or lower than 350°C; the buffer layer for the photoelectric element obtained by the method; and the photoelectric element having the buffer layer obtained by the method. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011146594(A) 申请公布日期 2011.07.28
申请号 JP20100007352 申请日期 2010.01.15
申请人 TOYOTA CENTRAL R&D LABS INC;INSTITUTE OF NATIONAL COLLEGES OF TECHNOLOGY JAPAN 发明人 TAJIMA SHIN;FUKANO TATSUO;KATAGIRI HIRONORI
分类号 H01L31/04;H01L21/208;H01L21/477 主分类号 H01L31/04
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