发明名称 THERMAL ISOLATION ASSEMBLIES FOR WAFER TRANSPORT APPARATUS AND METHODS OF USE THEREOF
摘要 An apparatus for treating a workpiece, the apparatus comprising a first chamber configured to treat the workpiece at an elevated temperature, the first chamber including an opening for receiving the workpiece; a second chamber in operative communication with the first chamber, the second chamber including an opening for transferring the workpiece to and from the first chamber, wherein the first chamber opening is aligned with the second chamber opening, and wherein a selected one of the first and the second chambers comprises a gate valve configured to selectively open and close access to the first and second chamber openings; and a thermal isolation plate formed of a material effective to substantially prevent heat transfer from the first chamber to the second chamber, wherein the thermal isolation plate is disposed about the first and second chamber openings in a sealing relationship.
申请公布号 US2011180097(A1) 申请公布日期 2011.07.28
申请号 US20100694597 申请日期 2010.01.27
申请人 AXCELIS TECHNOLOGIES, INC. 发明人 HUSEINOVIC ARMIN;BERRY IVAN L.
分类号 G03F7/42 主分类号 G03F7/42
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