发明名称 |
METHOD FOR PRODUCING A MIRROR HAVING AT LEAST TWO MIRROR SURFACES, MIRROR OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY, AND PROJECTION EXPOSURE APPARATUS |
摘要 |
The invention relates to a mirror (M) of a projection exposure apparatus for rnicrolithography for the structured exposure of a light-sensitive material and to a method for producing a mirror (M), The mirror (M) according to the Invention has a substrate body (B), a first mirror surface (S) and a second mirror surface (S5). The first mirror surface (S) is formed on a first side (VS) of the substrate body (3). The second mirror surface (S') is formed on a second side (RS) of the substrate body (B), said second side being different from the first side of the substrate body (B). The mirror (M) according to the invention can be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material. |
申请公布号 |
WO2011020690(A3) |
申请公布日期 |
2011.07.28 |
申请号 |
WO2010EP61148 |
申请日期 |
2010.07.30 |
申请人 |
CARL ZEISS SMT GMBH;HETZLER, JOCHEN;MUELLER, RALF;SINGER, WOLFGANG |
发明人 |
HETZLER, JOCHEN;MUELLER, RALF;SINGER, WOLFGANG |
分类号 |
G02B13/14;G02B17/06;G03F7/20 |
主分类号 |
G02B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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